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论述了去污上光剂的去污上光原理，配方的选择以及主要技术指标的测定方法。结果表明，去污上光剂表面张力为２４．３×１０－３Ｎ／ｍ，５ｍｉｎ后润湿面为１４．１°～１２．９°
Discusses the decontamination polish smear polishing principle, the choice of formulations and the determination of the main technical indicators. The results showed that the surface tension of decontamination polish was 24.3 × 10-3N / m, the wetting surface was 14.1 ° ~ 12.9 ° after 5 min