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The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67×10~4 is fabricated with photolithographic techniques.Reactive ion beam etching(RIBE)is used to get the silica disks with photoresist masks on SiO_2/Si made by standard ultraviolet(UV)photolithography, and spontaneous silicon etching by XeF_2 is used to fabricate the silicon micropillars.This fabrication process can control the microcavity geometry,leading to high experiment repeatability and controllable cavity modes.These characteristics are important for many applications in which the microcavity is necessary,such as the quantum gate.
The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67 × 10 -4 is fabricated with photolithographic techniques. Reactive ion beam etching (RIBE) is used to get the silica disks with photoresist masks on SiO 2 / Si made by standard ultraviolet (UV) photolithography, and spontaneous silicon etching by XeF_2 is used to fabricate the silicon micropillars. This fabrication process can control the microcavity geometry. leading to high experiment repeatability and controllable cavity modes. These characteristics are important for many applications in which the microcavity is necessary, such as the quantum gate.