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研究了Ni－P、Ni－P－Si3N4非晶态合金薄膜的电沉积工艺，通过SEM－EDS，XRD，EMPA等微观分析方法，提出了获取8～14wt%Ni-P和Ni-PSi3N4．非晶合金镀层的镀液组成和电沉积参数．实验表明，Ni－P非晶态合金镀层在碱液中具有优越的耐蚀性能，在含Cl－1的中性盐溶液中有良好的耐蚀性，且不产生点蚀；Ni－P－Si3N4非晶合金镀层，经晶化处理后，耐蚀性能提高，且与基材呈冶金结合。
Electrodeposition of amorphous Ni-P and Ni-P-Si3N4 thin films was studied. The microstructure of Ni-P and Ni-P-Si3N4 thin films was studied by means of SEM-EDS, XRD and EMPA. Amorphous alloy coating bath composition and electrodeposition parameters. Experiments show that, Ni-P amorphous alloy coating has excellent corrosion resistance in lye, neutral salt solution containing Cl-1 has good corrosion resistance, and does not produce pitting; Ni-P- Si3N4 amorphous alloy coating, after crystallization, corrosion resistance increased, and metallurgical bonding with the substrate.