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A surface plasmon interference lithography assisted by a Fabry Perot (F-P) cavity composed of subwavelength metal gratings and a thin metal film is proposed to fabricate high-quality nanopattes.The calculated results indicate that uniform straight interference fringes with high contrast and high electric-field intensity are formed in the resist under the F-P cavity.The analyses of spatial frequency spectra illuminate the physical mechanism of the formation for the interference fringes.The influence of the F-P cavity spacing is discussed in detail.Moreover,the error analyses reveal that all parameters except the metal grating period in this scheme can bear large tolerances for the device fabrication.