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以微弧氧化10 min后的陶瓷膜层为阴极,研究在阴极放电环境下该膜层的剥离行为。利用扫描电镜(SEM)和X射线能谱仪(EDS),分析了膜层剥离前后的表面形貌和成分。结果表明,阴极环境下电子交换过程中的气体冲击对微弧氧化膜层有着一定的剥离能力。在相同的电参数条件下,对黑色沉积膜层处理18 min后,基体表面的该膜层可完全剥离;剥离后的基体表面较为平整,但有微弧氧化过程中形成的微孔。白色原位生长膜层剥离处理后表面较粗糙,且出现了分层现象。
The micro-arc oxidation of the ceramic film after 10 min as the cathode, in the cathode discharge environment of the film stripping behavior. The morphology and composition of the surface before and after film peeling were analyzed by scanning electron microscopy (SEM) and X-ray energy dispersive spectrometer (EDS). The results show that the gas impact during the electron exchange process in the cathode environment has a certain ability to peel off the micro-arc oxidation film. Under the same electrical parameter conditions, the film on the surface of the substrate can be completely peeled off after the black deposited film is treated for 18 min. The surface of the peeled substrate is relatively flat but has micropores formed during the micro-arc oxidation. White in situ growth of film peeled off the rough surface, and the phenomenon of stratification.