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A new approach for fabricating B4C/Cu graded composite by rapid self-resistance sintering under ultra-high pressure was presented, by which a near dense B4C/Cu graded composite with a compositional spectrum of 0-100% was successfully fabricated. Plasma relevant performances of sintered B4C/Cu composite were preliminarily characterized, it is found that its chemical sputtering yield is 70% lower than that of SMF800 nuclear graphite under 2.7keV D+ irradiation, and almost no damages after 66 shots of in situ plasma discharge in HL-1 Tokamak facility, which indicates B4C/Cu plasma facing component has a good physical and chemical sputtering resistance performance compared with nuclear graphite.
A new approach for fabricating B4C / Cu graded composite by rapid self-resistance sintering under ultra-high pressure was presented, by which a near dense B4C / Cu graded composite with a compositional spectrum of 0-100% was successfully fabricated. Plasma relevant performances of sintered B4C / Cu composite were preliminarily characterized, it was found that its chemical sputtering yield was 70% lower than that of SMF800 nuclear graphite under 2.7 keV D + irradiation, and almost no damages after 66 shots of in situ plasma discharge in HL- 1 Tokamak facility, which indicates B4C / Cu plasma facing component has a good physical and chemical sputtering resistance performance compared with nuclear graphite.