Surface plasmon interference pattern on the surface of a silver-clad planar waveguide as a sub-micro

来源 :中国科学：物理学、力学、天文学英文版 | 被引量 : 0次 | 上传用户：xjx

【摘要】

：

A new sub-micron photolithography tool has been realized by utilizing the interference of surface plasmon waves(SPWs) on the near surface of a silver(Ag)-clad u

【作者】

：

ZHU QiuXiang HU CanDong WANG W

【机构】

：

KeyLaboratoryofElectroluminescentDevicesofGuangdongProvincialEducationDepartment,JiangsuProvincialKe

【出处】

：

中国科学：物理学、力学、天文学英文版

【发表日期】

：

2011年2期

【关键词】

：

表面等离子体亚微米光刻平面波导工具干涉条纹近场扫描光学显微镜近场光学显微镜银 surface plasmon waves（SPW） silver（

【基金项目】

：

This work was supported by the Natural Science Foundation of Guangdong Province, China （Grant Nos. 8251063101000007, 10151063101000009, and 9451063101002082）, the Scientific and Technological Plan of

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A new sub-micron photolithography tool has been realized by utilizing the interference of surface plasmon waves(SPWs) on the near surface of a silver(Ag)-clad ultraviolet(UV) planar waveguide.A laser beam with a wavelength of 325 nm was incident into the

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Surface plasmon interference pattern on the surface of a silver-clad planar waveguide as a sub-micro

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