论文部分内容阅读
在不久前召开的 SPIE Microlithography(国际光学工程学会微光刻技术年度会议)上,BACUS(国际光掩膜技术学会)组织了一次圆桌会议,来自光刻技术领域的专家们就193纳米浸没式光刻技术中光掩膜工艺的发展趋势展开了激烈的讨论。会议的中心话题为光掩膜制造商是沉是浮?考虑到光掩膜工艺在实际应用中必不可少,光掩膜工业别无选择只能浮游一也许会像蝶泳那样姿态优美、劈波斩浪,也许只会像狗爬式游泳那样匍匐前进。尽管如此,与会者还是就面临的挑战和将会生存的环节给出了引人注目的展望。顾问 Brian Grenon,也是会议的主持人之一认为在浸没式光刻技术所面的临诸多问题和挑战中,光掩膜工艺并没有位列其
At the recent SPIE Microlithography (International Society of Optical Engineering Microlithography Annual Meeting), BACUS (International Photomask Technology Society) organized a roundtable meeting with experts from the field of lithography on the 193 nm immersion light Engraving technology in the development trend of the mask technology launched a heated discussion. At the center of the conference was the photomask manufacturer Shen Floating? Considering that the photomask process is indispensable in practical applications, the photomask industry has no choice but to float. It may look and feel beautiful like a butterfly stroke, Maybe just crawl like a dog-crawl. Nevertheless, attendees gave compelling perspectives on the challenges they face and the links that will survive. Consultant Brian Grenon, one of the moderators at the conference, thinks that the photomask process is not among the many issues and challenges facing immersion lithography