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本工作设计制作了一种新型的三段式反应气体进气系统。该进气系统由镀膜真空室内和室外两部分结构组成。真空室内的进气主管由三段进气分管组成,其上装有等间距的进气喷嘴。真空室外装有与各进气分管对应的流量调节针阀。调试反应溅射Al2O3均匀性的方法如下。首先粗调流量调节针阀,改变各进气分管间的反应气体进气流量分布,然后更换不同横截面积的进气喷嘴,进一步调节反应气体进气流量沿靶长度方向分布。交替重复以上调试过程2~3次,即可获得沿靶长度方向上反应溅射沉积均匀、透明的Al2O3薄膜。本工作在高1650 mm,宽2440 mm的靶前后两块大面积玻璃上,试验沉积了Al2O3/Ag/Al2O3低辐射薄膜。结果表明沉积的低辐射膜在靶前后两块大面积玻璃上均匀性好,可见光吸收比相对标准偏差小于4%。
This work designed a new type of three-stage reaction gas intake system. The intake system consists of a coating vacuum chamber and an outdoor two-part structure. The intake manifold in the vacuum chamber consists of three sections of intake manifolds with intake nozzles at equal intervals. The vacuum chamber is equipped with a flow regulating needle corresponding to each intake manifold. The method of adjusting the uniformity of Al2O3 sputtered by sputtering is as follows. First of all, the flow control needle is coarsely tuned to change the flow distribution of reactant gas between the intake manifolds. Then, the intake nozzles with different cross-sectional areas are changed to further adjust the flow distribution of reactant gas along the length of the target. Alternately repeat the above debugging process 2 or 3 times to obtain a uniform and transparent Al2O3 film deposited by reactive sputtering along the length of the target. This work on the 1650 mm high, 2440 mm wide target before and after the two large area glass, the test deposition of Al2O3 / Ag / Al2O3 low emissivity film. The results show that the deposited low emissivity film has good uniformity on two large glass areas before and after the target, and the relative standard deviation of visible light absorption is less than 4%.