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通过求解雷诺平均Navier-Stokes方程模拟了不同激励频率下等离子体合成射流诱导的流场,其中等离子体激励器采用体积力唯象模型模拟.计算结果表明,随着激励频率的增大,激励器诱导的相邻两个涡对的流向间距单调减小,涡对引起的速度波动范围变小,激励频率f=60Hz时,相邻两个周期内所形成的涡对很快融合在一起,下游的流场结构更接近于定常激励的情况.激励频率对等离子体合成射流平均流场几乎没有影响.等离子体激励频率较小时(f<40Hz),等离子体合成射流在近壁面区域内的动量随着激励频率的增大而增大,在距壁面较远位置以后,变化趋势相反.
The flow field induced by the plasma jet was simulated by solving the Reynolds-averaged Navier-Stokes equation, in which the plasma actuator was modeled using a volume-force phenomenological model. The calculated results show that as the excitation frequency increases, The distance between the adjacent two vortex pairs decreases monotonically and the range of velocity fluctuation caused by the vortex pairs becomes smaller. When the excitation frequency f = 60Hz, the vortex pairs formed in the adjacent two periods fuse together quickly, and the downstream The results show that the excitation frequency has almost no effect on the average flow field of the plasma jet.When the plasma excitation frequency is small (f <40Hz), the momentum of the plasma jet in the near-wall region With the excitation frequency increases and increases, in the far position from the wall, the trend of the opposite.