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大面积、高质量碲锌镉单晶是制备碲镉汞红外焦平面器件的理想衬底材料,而腐蚀法是常用的揭示碲锌镉晶体缺陷和评价晶体质量的方法之一。对碲锌镉晶体常用的Nakagawa、Everson、EAg1和EAg2四种腐蚀剂在碲锌镉材料(111)晶面上的腐蚀坑坑形进行了研究,结果发现,EAg2腐蚀剂在(111)B面上的腐蚀坑为平底坑,Everson腐蚀剂在(111)B面上产生的腐蚀坑包括平底坑和带有不同倾斜方向坑底的三角锥形坑,进一步的研究还表明,三角锥形坑并未沿着坑底的倾斜方向向下延伸。实验中也首次观察到了EAg腐蚀剂的黑白平底坑。对常用腐蚀剂的坑形特性研究,将有助于更好地利用腐蚀剂开展碲锌镉材料缺陷研究和晶体质量评价工作。
Large-area and high-quality CdTe single crystals are ideal substrates for the preparation of HgCdTe infrared focal plane devices. However, the etching method is one of the commonly used methods to reveal the defects of the CdTe crystal and evaluate the crystal quality. The corrosion pits of Nakagawa, Everson, EAg1 and EAg2 commonly used in tellurium-zinc-tellurium crystals on the (111) crystal surface of tellurium-zinc-cadmium were investigated. It was found that EAg2 etchant on the (111) The corrosion pit is a flat pit. The corrosion pits on the (111) B surface of the Everson etchant include flat pits and triangular pyramidal pits with pit bottom with different inclination directions. Further studies also show that the triangular pyramidal pits are not along The bottom of the pit tilts downwardly. For the first time, a black and white pit of EAg etchant was also observed in the experiment. The study on the pit-shape characteristics of commonly used etchants will help to make better use of etchants to study the defect of zinc telluride materials and evaluate the crystal quality.