TiO2 nanofilm growth by Ti ion implantation and thermal annealing in O2 atmosphere

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TiO2 nanofilms on surface of fused silica were fabricated by Ti ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by 20 k V Ti ions to 1.5 × 1017ions/cm2 on an implanter of metal vapor vacuum arc(
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