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自制靶材,采用射频磁控溅射法制备超亲水TiO_2/SiO_2非晶复合薄膜,用XRD、AFM、XPS、液滴形状分析仪等方法进行表征。研究了溅射气氛、射频功率以及溅射时间对薄膜亲水性能的影响,并探讨了TiO_2/SiO_2非晶复合薄膜的超亲水机理。结果表明,Ti、Si元素进入薄膜晶格,在TiO_2/SiO_2薄膜界面形成Si—O—Ti键,约为22.4%;Si—O—Ti键的形成增加薄膜表面酸性,提高薄膜表面羟基含量,使薄膜具有超亲水特性。
Self-made target materials were prepared by radio-frequency magnetron sputtering super-hydrophilic TiO_2 / SiO_2 amorphous composite films, characterized by XRD, AFM, XPS, drop shape analyzer. The effects of sputtering atmosphere, RF power and sputtering time on the hydrophilicity of the films were investigated. The superhydrophilic mechanism of TiO_2 / SiO_2 amorphous films was also discussed. The results show that Ti and Si elements enter into the lattice of the thin film and form Si-O-Ti bond at the interface of TiO 2 / SiO 2 film, which is about 22.4%. The formation of Si-O-Ti bond increases the acidity of the film surface, The film has super hydrophilic character.