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美国IBM公司与Toppan Printing公司同意联合开发下一代45 nm半导体制程用的光掩膜。这两家公司开发一种光掩膜工艺,意在能及早地制造45 nm器
U.S. IBM and Toppan Printing agreed to jointly develop a photomask for the next generation of 45 nm semiconductor processes. The two companies have developed a photomask process that aims to make 45 nm devices early