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离子束刻蚀作为真空技术的一种重要应用,已广泛运用于现代微电子器件和微光学器件的制作工艺中。本文结合反应离子束刻蚀与全息光刻技术,针对线密度较低的小阶梯光栅,倾斜刻蚀石英同质掩模,制作了三种在紫外光和可见光波段透射闪耀的小阶梯光栅。第一种光栅线密度为360lp/mm,闪耀角16.8°,在325nm波长的透射衍射效率为74%;第二种和第三种光栅线密度均为400lp/mm,闪耀角为34.7°和43°,其在632.8nm波长的透射衍射效率分别为63%和57%。结果表明,使用CHF_3作为刻蚀气体的反应离子束刻蚀石英同质掩模,所制作的小阶梯光栅在其工作波段透射闪耀的衍射效率为理论值的75%以上,为全息离子束制作低线密度大闪耀角的光栅提供参考。
Ion beam etching as an important application of vacuum technology, has been widely used in modern microelectronics and micro-optical device manufacturing process. Combined with reactive ion beam etching and holographic lithography, aiming at the low linear density graded grating, three kinds of small graded gratings are fabricated by obliquely etching the quartz homogeneous mask and transmitting in ultraviolet and visible light. The first grating has a line density of 360 lp / mm, a blaze angle of 16.8 °, and a transmission diffraction efficiency of 74% at a wavelength of 325 nm; the second and third raster line densities are 400 lp / mm, the blaze angles are 34.7 ° and 43 °, its transmission diffraction efficiency at 632.8nm wavelength is 63% and 57% respectively. The results show that the diffraction efficiency of the small graded grating made by the reactive ion beam etching with CHF_3 as etching gas is above 75% of the theoretical value, which is the theoretical value for holographic ion beam fabrication Gratings with large blaze angles provide a reference.