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通过溶胶 -凝胶和聚苯乙烯模板等方法制备了含缺位 Keggin阴离子 Si W1 1 O8- 3 9和 γ-Si W1 0 O8- 3 6的三维有序大孔杂化氧化硅复合材料 ,并通过紫外漫反射光谱 ( UV/ DRS)、傅里叶变换红外光谱 ( FTIR)、固体核磁共振波谱 ( MAS NMR)等手段对其结构进行了表征 .结果表明 ,杂化材料中的 Keggin阴离子仍保留其基本骨架结构 ,但其与氧化硅基体之间存在化学作用 .杂化材料的孔道结构用扫描和透射电子显微镜 ( SEM和TEM)进行表征 ,其平均孔径为 ( 335± 5 0 ) nm.对杂化材料孔壁的微孔性通过氮气吸附进行了测定 .此类材料对水溶液中羟基丁二酸的降解反应具有活性 ,光催化过程中未发现 Keggin阴离子自载体中脱落的现象 .
Three-dimensional ordered macroporous silica composites with vacancies of Keggin anions Si W1 1 O8- 3 9 and γ-Si W1 0 O8- 3 6 were prepared by sol-gel and polystyrene templates Their structures were characterized by UV / DRS, FTIR and MAS NMR. The results showed that the Keggin anions in hybrid materials remained Its basic framework structure, but it has a chemical interaction with the silicon oxide matrix.The pore structure of the hybrid material is characterized by scanning and transmission electron microscopy (SEM and TEM) with an average pore diameter of (335 ± 500) nm. The microporosity of the pore walls of the hybrid material was measured by nitrogen adsorption.These materials have activity on the degradation reaction of hydroxyl succinic acid in aqueous solution, and the phenomenon that the Keggin anion comes off from the carrier is not found in the photocatalytic process.