Thin film is a widely used structure in the present microelectromechanical systems (MEMS) and plays a vital role in many functional devices. However, the great size difference between the film's thickness and its planar dimensions makes it difficult to study the thin film performance numerically. In this work, a scaling transformation was presented to make the different dimensional sizes equivalent, and thereby, to improve the grid quality considerably. Two numerical experiments were studied to validate the present scaling transformation method. The numerical results indicated that the largest grid size difference can be decreased to one to two orders of magnitude by using the present scaling transformation, and the memory required by the numerical simulation, i.e., the total grid number, could be reduced by about two to three orders of magnitude, while the numerical accuracies with and without this scaling transformation were nearly the same.