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报导了用等离子体增强化学气相沉积法于５６０℃在高速钢基材上沉积Ｔｉ－Ｓｉ－Ｎ膜。反应气为ＴｉＣｌ４，ＳｉＣｌ４，Ｎ２和Ｈ２。实验结果表明：调整两种氯化物在进气中的比例可以很好地控制膜的成分。膜中Ｓｉ含量变化范围为０到４０％（原子）。在ＴｉＮ膜中加入少量Ｓｉ就可以显著改善膜的形貌，得到致密的类似玻璃的结构。同样，膜和基材之问的界面显得更加平滑和均匀。含Ｓｉ量１０％～２５％（原子）的Ｔｉ－Ｓｉ－Ｎ膜具有最高的硬度，约达到６３５０ｋｇｆ／ｍｍ２，比ＴｉＮ膜高得多。
Reported the deposition of a Ti-Si-N film on a high speed steel substrate by a plasma-enhanced chemical vapor deposition method at 560 ° C. The reaction gas is TiCl4, SiCl4, N2 and H2. The experimental results show that adjusting the proportions of the two chlorides in the intake air can control the composition of the membrane well. The Si content in the film varies from 0 to 40% (atomic). Adding a small amount of Si into the TiN film can significantly improve the morphology of the film to obtain a compact, glass-like structure. Similarly, the interface between the film and substrate appears smoother and more uniform. The Ti-Si-N film containing 10% -25% Si (atomic) has the highest hardness of about 6350kgf / mm2, which is much higher than that of the TiN film.