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用普通的射频二极溅射工艺沉积出了PLZT铁电薄膜。溅射用靶材的化学组成为7/65/35和8/65/35,经烧结得到直径为100毫米的陶瓷靶。为弥补溅射过程中铅的流失,在靶中外加重量为4%和8%的PbO。衬底材料为GG17玻璃、石英玻璃以及不锈钢片等,前两种用于检测薄膜的光性和结构,后一种主要用于测量介电和铁电性能。在氧-氩混合气氛中进行
PLZT ferroelectric thin films were deposited using a conventional radio-frequency diode sputtering process. The target for sputtering has a chemical composition of 7/65/35 and 8/65/35 and is sintered to obtain a ceramic target with a diameter of 100 mm. To compensate for the loss of lead during the sputtering process, 4% and 8% PbO were added to the target. The substrate material is GG17 glass, quartz glass and stainless steel, the first two used to detect the film of light and structure, the latter is mainly used to measure the dielectric and ferroelectric properties. In an oxygen-argon mixed atmosphere