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0600238 光刻胶线边沿粗糙度量化Ⅰ上下扫描电子显微图象的离线与在线分析=Quantification of line-edge roughness of photorsists．I．A comparison between off-line and online analysis of top-down scanning electron microscopy images[刊,英]／G．P．Patsis,V．Constantoudis／／Journal of Vacuum Science ＆ Technology B．-2003,21(3)．- 1008-1018(E) 0600239 负向化学放大抗蚀剂的表面和线边沿粗糙度以及凝胶形成蒙特卡罗模拟=Monte Carlo simulation of gel formation and surface and line-edge roughness in negative
0600238 Quantification of Line Edge Roughness of Photolithography Lines I Off-line and on-line analysis of up and down scanning electron micrographs = Quantification of line-edge roughness of photorsists I. A comparison between off-line and online analysis of top-down scanning electron microscopy images [Journal, English] / G. P. Patsis, V. Constantoudis // Journal of Vacuum Science & Technology B. -2003,21 (3). - 1008-1018 (E) 0600239 Monte Carlo simulation of surface formation and surface-line-edge roughness in negative chemically amplified resist and gel formation