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无机薄膜在现代科学技术中占有重要地位。CVD法是制备这类薄膜的有效手段之一.它装置简单,操作方便,工艺重现性好,且可在沉积薄膜的过程中随时调节薄膜的组成.过去20年里,在常压CVD得到广泛应用的同时,低压CVD、等离子体增强CVD(包括微波等离子体CVD)、光激发CVD(包括激光激发CVD)相继出现,并被成功地应用于优质薄膜的制备中。可预言,随着实践和理论的不断发展,CVD将更广泛地应用于现代科技领域中.
Inorganic thin film occupies an important position in modern science and technology. CVD method is one of the effective methods for preparing such thin films.It has the advantages of simple device, easy operation, good process reproducibility, and the film composition can be regulated at any time during the deposition of thin films.In the past 20 years, In the meantime, low pressure CVD, plasma enhanced CVD (including microwave plasma CVD) and photoexcited CVD (including laser induced CVD) have appeared one after another and are successfully applied in the preparation of high quality thin films. Predictably, with the continuous development of practice and theory, CVD will be more widely used in modern science and technology.