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基于皮秒激光的“冷加工”特点,进行了用皮秒激光辐照结合快速化学腐蚀(Na OH溶液:质量分数为4%,不大于3 min,80℃水浴)调控工艺制备高效减反射晶硅表面微结构的研究,在400~1000 nm波长的宽光谱范围内,获得了微-纳双结构微孔阵列和圆顶锥形周期性阵列两种减反射表面,前者的平均反射率低于5%,后者的平均反射率低于10%。制备过程中工艺可控性强,无需掩膜和真空环境。研究了激光工艺参数和化学腐蚀参数的不同调控匹配在微结构单元形成中的作用机制,分析了所制备表面微结构的减反射机理,为太阳能电池和其他半导体器件中硅基减反射表面微结构的低成本激光可控制造提供了重要的指导。
Based on the “cold working” characteristic of picosecond laser, a picosecond laser irradiation combined with rapid chemical etching (NaOH solution: mass fraction 4%, no more than 3 min, 80 ℃ water bath) In the study of the microstructure of the crystalline silicon surface, two kinds of antireflection surfaces of micro-nano double-structure micropore arrays and dome-shaped conical periodic arrays were obtained in the wide spectral range of 400-1000 nm. The average reflectance of the former is low At 5%, the average reflectance of the latter is less than 10%. Process controllable preparation process, without mask and vacuum environment. The mechanism of different control matching of laser process parameters and chemical corrosion parameters in the formation of microstructured units was studied. The antireflection mechanism of the prepared microstructures was analyzed, and the microstructure of Si-based antireflection surface in solar cells and other semiconductor devices The low-cost laser-controlled manufacturing provides an important guide.