一、引言 测量半导体材料电阻率的方法很多,四探针是最重要最常用的,它不仅简单可靠,而且是直接测量,可作为校准其它方法的标准。对于薄层样品,例如薄外延或浅离子注入样品。经金属线状四探针测量之后,薄层往往遭到破坏,甚至引起短路或穿透,如果用水银探针与硅接触,则测量之后,样品完好无缺,不留下任何损伤。实际上,用水银探针进行肖特基C I. INTRODUCTION There are many ways to measure the resistivity of semiconductor materials. Four-probe is the most important and most commonly used one. It is not only simple and reliable, but also a direct measurement, which can be used as a standard to calibrate other methods. For thin-layer samples, such as thin-epitaxial or shallow-ion implanted samples. After the metal linear four-probe measurement, the thin layer is often damaged, and even cause short circuit or penetration, if the mercury probe with silicon contact, after measurement, the sample is intact, leaving no damage. In fact, mercury probes are used for Schottky C.