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锰钴镍复合氧化物是一种具有半导体性质的热敏材料.本文采用金属有机沉积技术于室温条件下、在Si衬底上沉积一定厚度的Mn1.74Co0.72Ni0.54O4金属有机化合物薄膜,并通过醇热反应进行低温结晶化合成,可得到Mn1.74Co0.72Ni0.54O4结晶薄膜.通过X射线衍射、场发射扫描电子显微镜(FESEM)以及阻温特性等测试方法表征,讨论了醇热反应对锰钴镍热敏薄膜的物相结构、微观形貌以及电学性能的影响.X射线衍射图显示薄膜已出现尖晶石结构的特征峰.电镜照片说明结晶薄膜的表面较为平整、孔隙率低.阻温特性关系表明薄膜具有明显的负温度系数效应,室温(≈27°)电阻率约为303.13Ω·cm.
Mn-Co-Ni composite oxide is a kind of semiconductor material with thermal conductivity.In this paper, metal organic deposition technique was used to deposit a certain thickness of Mn1.74Co0.72Ni0.54O4 metal organic compound thin film on Si substrate at room temperature Crystallization of the Mn1.74Co0.72Ni0.54O4 thin films by alcoholic thermal reaction at low temperature was investigated by X-ray diffraction, field emission scanning electron microscopy (FESEM) and resistance temperature characteristics. The effects of alcohol thermal reaction The microstructure and electrical properties of Mn-Co-Ni thermal films were characterized by X-ray diffraction (XRD), which shows that the spinel structure has been observed. The SEM images show that the surface of the films is smooth and the porosity is low. The relationship between temperature resistance shows that the film has a significant negative temperature coefficient of effect, the room temperature (≈ 27 °) resistivity of about 303.13Ω · cm.