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本文从光源波长、照明系统和工艺控制方面介绍了国外光学分步曝光技术的最新进展。着重叙述了世界几大著名光刻设备公司在其研究领域的设计更新和实施效果，展望了光学分步曝光技术在甚大规模集成电路（ＵＬＳＩ）制造中的潜力。
In this paper, the latest progress of foreign optical step-by-step exposure technology is introduced from light source wavelength, lighting system and process control. Focuses on the design update and implementation effect of several well-known lithographic equipment companies in the field of their research, and looks forward to the potential of optical step-by-step exposure technology in very large scale integrated circuit (ULSI) manufacturing.