这次会议于88年5月31日至6月3日在美国佛罗里达州的洛德代尔堡举行。参加会议代表最多的为美国(273人),其次是欧州(71人)和日本(33人),提交大会的论文共171篇,大会同意采纳129篇,比以往各届有较大的增加。从内容来看,电子束占18％,离子束占18％,抗蚀剂占17％,X射线占13％,微细器件加工占11％,蚀刻占9％,其余为物理评价和表面反应等内容的文章。从提供论文的数量来分,美国占62％,日本占16％,西德占9％。 The meeting was held in Fort Lauderdale, Florida from May 31 to June 3, 88. The largest number of participants in the conference was the United States (273), followed by Europe (71) and Japan (33). A total of 171 papers were submitted to the conference. The conference agreed to adopt 129 articles, a substantial increase over previous sessions. In terms of content, the electron beam accounts for 18%, the ion beam 18%, the resist 17%, the X-ray 13%, the fine device 11%, the etching 9%, and the rest are physical evaluation and surface reaction Content article. From the number of papers provided, the United States accounted for 62%, Japan accounted for 16%, West Germany accounted for 9%.