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采用射频溅射法成功地制备了NiTi形状记忆合金薄膜。研究了不同成分靶材对膜最终成分的影响。电子探针和俄歇能谱仪测定结果表明,在Ni(50at%)/Ti(50at%)的靶材上添入适量的Ti,可以获得Ni/Ti为1:1的薄膜。经晶化处理后,其结构为B2,用电阻法和差热分析确定TAs,TAf,TMs和TMf点分别为22,44,30,60℃。观察到了形状记忆现象。
NiTi shape memory alloy thin films were successfully fabricated by RF sputtering. The effects of different compositional targets on the final composition of the membrane were investigated. The results of electron probe and Auger spectroscopy show that Ni / Ti film with 1: 1 Ni / Ti can be obtained by adding suitable amount of Ti to Ni (50at%) / Ti (50at%) target. After crystallization treatment, the structure of B2, using the resistance method and differential thermal analysis to determine the TAs, TAf, TMs and TMf points were 22,44,30,60 ℃. Shape memory was observed.