一、前言在玻璃基板表面上制备的氧化锡透明导电膜广泛应用于各种显示器件,例如电视摄象管(光导摄象管、正折象管、氧化铝光电摄象管和硒靶视象管)、气体放电显示器件以及液晶显示等。这些显示器件要求制备的膜具有高导电率、高透明度,而且要均匀、不模糊、无污点。过去所采用的喷涂法很难获得均匀、高透明度和不模糊的膜。为此,近几年出现了几种制备氧化锡透明导电膜的新方法。其中有雾化法、 I. INTRODUCTION The tin oxide transparent conductive films prepared on the surface of glass substrates are widely used in various display devices such as television cameras (photoconductive tubes, fz tubes, alumina photoconductive tubes and selenium target images Tube), gas discharge display devices and liquid crystal display. These display devices require that the prepared films have high electrical conductivity, high transparency, and be uniform, unambiguous and stain-free. The spray methods used in the past made it difficult to obtain uniform, highly transparent and unambiguous films. To this end, in recent years there have been several new methods for preparing tin oxide transparent conductive films. Among them there are atomization method,