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本文制备了硅基和光刻胶两种材料的纳米光栅,利用光谱椭偏仪对该纳米结构的光栅进行了测量,随后利用建立的拟合模型对其测量数据进行了拟合,结果证明了运用该仪器进行纳米光栅结构无损检测的可行性,在入射角60?,方位角75?的测量条件下,纳米结构关键尺寸、侧壁角等三维形貌参数的测量精度最大可达99.97%,该技术对于无损检测有着一定的推动意义.
In this paper, two kinds of nanostructures based on silicon and photoresist were prepared, and the grating of the nanostructure was measured by spectroscopic ellipsometry. Then, the measured data were fitted by the established fitting model. The results show that The feasibility of non-destructive testing of nanostructures with this instrument is proved. Under the measurement conditions of 60 ° angle of incidence and 75 ° azimuth, the measurement accuracy of three-dimensional topography parameters such as the critical dimension of nanostructures and sidewall angle can reach as high as 99.97% The technology has certain promotion significance for nondestructive testing.