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The temperature-driven spin reorientation transition of magnetron sputtered Ni/Si(111) systems has been studied.The relationship between ac initial susceptibility and temperature of nickel films with different thicknesses shows that the magnetization orientation changes from in-plane to out-of-plane with the increase of temperature.The temperature dependence of magnetoelastic,magneto-crystalline,and magnetostatic anisotropies determines the direction of the reorientation transition.The temperature-driven spin reorientation transition is supported by Hall coefficient measurements which show that its temperature dependence is similar to that of susceptibility.
The temperature-driven spin reorientation transition of magnetron sputtered Ni / Si (111) systems has been studied. The relationship between ac initial susceptibility and temperature of nickel films with different thicknesses shows that the magnetization orientation changes from in-plane to out-of- plane with the increase of temperature.The temperature dependence of magnetoelastic, magneto-crystalline, and magnetostatic anisotrop determines the direction of the reorientation transition. The temperature-driven spin reorientation transition is supported by Hall coefficient measurements which show that its temperature dependence is similar to that of susceptibility.