The relationship between the maximum shear stress in a substrate solid and the elastic wave reflection coefficient from the interface between the substrate solid and an overlying solid half-space is investigated. Both substrate and overlying solid media are assumed to be initially isotropic and stress-free. Then as the substrate is subjected to horizontal confined stresses it becomes anisotropic. It is shown that longitudinal and shear wave reflection coefficients are related to the degree of stress induced anisotropy in the substrate medium. From this relation the confined stress level and the maximum shear stress generated on the vertical planes of the substrate are estimated. Authors in their previous investigation computed plane wave reflection coefficient in a biaxially compressed solid substrate immersed in a fluid. This paper reports for the first time how the maximum shear stress in a biaxially compressed substrate medium can be measured from the plane wave reflection coefficients when the overlying medium is also a solid half-space. The relationship between the maximum shear stress in a substrate solid and the elastic wave reflection coefficient from the interface between the substrate solid and an overlying solid half-space are assumed to be initially isotropic and stress-free . 是 什么 意思 _Those as the substrate is subjected to horizontal confined stresses it becomes anisotropic. It is shown that longitudinal and shear wave reflection coefficients are related to the degree of stress induced anisotropy in the substrate medium. stress generated on the vertical planes of the substrate are estimated. Authors in their previous investigation computed plane wave reflection coefficient in a biaxially compressed solid substrate immersed in a fluid. This paper reports for the first time how the maximum shear stress in a biaxially compressed substrate medium can be measured from the plane wave reflection coefficie nts when the overlying medium is also a solid half-space.