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用电子束蒸发方法在抛光玻璃衬底上分别制备了X射线激光用的稀土元素Nd ,Dy ,Er和Yb薄膜靶。用石英晶片作为陪片 ,通过测量晶振频率的方法研究了薄膜靶在真空、干燥空气及潮湿空气等不同环境中不同阶段的氧化层增长过程。发现除Yb薄膜在淀积结束后的干燥空气和潮湿空气环境中的氧化过程遵循倒对数规律之外 ,其它所有的氧化过程均可用对数规律很好地进行拟合。淀积结束后充入大气时 ,薄膜表面的快速氧化过程仅为数分钟。在相同的环境中 ,Nd氧化速率最高 ,Er和Dy其次 ,Yb最低 ;在不同的环境中 ,Nd受环境湿度的影响最大 ,Er和Dy其次 ,Yb最低。
The rare earth elements Nd, Dy, Er and Yb thin film targets for X-ray laser were prepared on the polished glass substrate by electron beam evaporation method. Quartz wafer was used as a paraphernalia to study the growth process of the oxide layer in different stages of vacuum deposition, dry air and humid air by measuring the crystal frequency. It was found that all the oxidation processes were well fitted by the logarithmic rule, except that the oxidation process of the Yb film in dry air and humid air after deposition was log-logarithmic. When the atmosphere is filled after deposition, the rapid oxidation of the surface of the film is only for a few minutes. In the same environment, Nd has the highest oxidation rate, followed by Er and Dy, and Yb has the lowest. In different environments, Nd is most affected by environmental humidity, followed by Er and Dy, and Yb is the lowest.