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采用酞菁铁高温裂解法在镀有镍金缓冲层的硅基底上生长了碳纳米管薄膜(Ni/Au-CNT),并采用二极结构在相同的主Marx电压下研究了其强流脉冲发射稳定性.结果表明:在脉冲电压峰值为1.60~1.74 MV(对应的脉冲电场峰值为11.43~12.43V/μm)时,Ni/Au-CNT薄膜首次发射的电流峰值可达331.2A;Ni/Au层不仅能提高CNT薄膜的强流脉冲发射电流峰值,还能提高其发射稳定性;当冷阴极重复脉冲发射7次时,Ni/Au-CNT的脉冲电流峰值衰减到初值的72%,而Ni–CNT和Si-CNT脉冲电流峰值分别衰减到初值的62%和32%.
Carbon nanotubes (Ni / Au-CNTs) were grown on a silicon substrate coated with nickel-gold buffer by pyrolysis method of iron phthalocyanine. The strong current pulse The results show that the peak current of Ni / Au-CNT can reach 331.2A for the first time when the peak value of pulse voltage is 1.60-1.74 MV (corresponding to the pulse electric field peak of 11.43-12.43 V / μm) The Au layer can not only increase the peak current of the high current pulse but also increase the emission stability of the CNT film. When the pulse repetition pulse is 7 times, the peak current of Ni / Au-CNT pulse decays to 72% While the peak values of Ni-CNT and Si-CNT pulsed current decay to 62% and 32% of their initial values, respectively.