因为氮化钽薄膜具有适合于提高灵敏度的、宽的热传导区、电阻值合适以及电阻温度系数大等优点,通过实验研究,证实了用氮化钽薄膜测量定范围的压力,已经取得较好的结果。这些试验引出一个新的薄膜系统结构,该系统是通过反应性等离子体溅射,在小型的、7059康宁玻璃基片上淀积氮化 Because tantalum nitride films have the advantages of a wide heat conduction area suitable for improving sensitivity, a suitable resistance value, and a large temperature coefficient of resistance, it has been confirmed through experimental studies that a tantalum nitride thin film can be used to measure the pressure in a given range and a good result. These experiments led to a new thin film system structure that was deposited by reactive plasma sputtering on a small, 7059 Corning glass substrate