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采用双靶反应磁控溅射的方法在40Cr基体上制备了TiAlN薄膜和WTiN薄膜。用XRD,SEM,AFM等检测手段对薄膜的表面状态及结构等进行了表征,采用UMT-3型多功能摩擦试验机,在室温、大气环境、无润滑的条件下对TiAlN和WTiN薄膜的摩擦性能进行了评价。实验结果表明:TiAlN薄膜出现了两种硬质相TiN与TiAlN共存的物相结构,而WTiN薄膜出现了TiN0.6O0.4,TiN,W2N,WN等多种物相结构;制备的TiAlN、WTiN薄膜表面晶粒均匀细小,生长均以粒状结构为主;摩擦实验数据表明制备的TiAlN和WTiN薄膜均拥有良好的摩擦性能。
TiAlN thin films and WTiN thin films were prepared on 40Cr substrate by double target reactive magnetron sputtering. The surface morphology and structure of the films were characterized by means of XRD, SEM and AFM. The tribological properties of TiAlN and WTiN films were tested by UMT-3 multi-purpose friction tester under room temperature, atmospheric conditions and without lubrication Performance was evaluated. The experimental results show that there are two kinds of phase structures of TiNN films coexisting with TiN and TiAlN, while the WTiN films have many phase structures such as TiN0.6O0.4, TiN, W2N and WN. TiAlN and WTiN The surface of the film is even and fine grains, and the growth is mainly granular structure. The friction experimental data show that the prepared TiAlN and WTiN films have good frictional properties.