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利用高功率磁控溅射(HPPMS)技术在无偏压及室温条件下,采用(Ti,Si10at%)靶在AZ31镁合金基体上制备了Ti-Si-N涂层,在基体与涂层之间插入Ti-Si及TiN层分别作为过渡层及缓冲层,对不同氮气流量下制备的涂层显微结构及纳米硬度进行了研究。实验表明:在AZ31软基体上可制备超硬度Ti-Si-N涂层,随着氮气流量增加膜中N含量增高,涂层颗粒尺寸远小于DCMS电源模式,当氩气氮气流量比为11∶5时TiN(200)出现择优取向,纳米压痕最大硬度值达48 GPa,远高于DCMS涂层硬度(33 GPa)。
The Ti-Si-N coating was prepared on AZ31 magnesium alloy by (Ti, Si10at%) target under high pressure and at room temperature using high power magnetron sputtering (HPPMS) The interlayers of Ti-Si and TiN were used as the transition layer and the buffer layer, respectively. The microstructure and nano-hardness of the coatings prepared under different nitrogen flow rates were studied. The experimental results show that the hardness of Ti-Si-N coating on AZ31 soft substrate can be increased with the increase of nitrogen flow, the particle size of the coating is much smaller than that of DCMS power supply. When the flow ratio of argon to nitrogen is 11 : 5, the preferred orientation of TiN (200) appears. The maximum hardness of nanoindentation reaches 48 GPa, much higher than that of DCMS coating (33 GPa).