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用于硅片台计量的二维测量干涉仪已被开发出来。它能同时测量线性位移和角位移，它被设计成置于密闭的环境中，减少了工作台质量，消除了热源，并能提供高分辨率和偏转速率。
Two-dimensional measuring interferometers for wafer stage measurement have been developed. It measures both linear and angular displacements simultaneously. It is designed to be placed in a closed environment, reducing work bench mass, eliminating heat sources and providing high resolution and deflection rates.