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用不同的方法在石英玻璃,YAG晶体,K9玻璃和LiNbO3晶体等几种衬底上制备了ZrO2,HfO2和TiO2薄膜。HfO2薄膜利用电子束蒸发(EB)、离子束辅助(IAD)和双束离子束溅射(DIBS)三种方法沉积。对其中的一些样品进行了不同温度下的退火处理,对所有的样品进行X射线衍射(XRD)测试,以获得不同条件下得到的薄膜的晶相及晶粒尺寸等的微结构参数。实验结果表明,薄膜的晶相结构以及晶粒尺寸强烈地依赖于沉积过程的各种技术参数,如衬底的种类、沉积温度、沉积方法和退火温度。利用薄膜表面扩散以及薄膜成核长大热力学原理解释了不同技术条件下的晶相结构和晶粒尺寸不同的原因。
ZrO2, HfO2 and TiO2 films were prepared by different methods on several substrates, such as quartz glass, YAG crystal, K9 glass and LiNbO3 crystal. HfO2 thin films were deposited by electron beam evaporation (EB), ion beam assisted (IAD) and double beam ion beam sputtering (DIBS). Some of them were annealed at different temperatures. All the samples were tested by X-ray diffraction (XRD) to get the microstructure parameters such as crystal phase and grain size of the obtained films under different conditions. The experimental results show that the crystalline phase structure and grain size of the films strongly depend on various technical parameters of the deposition process, such as the type of substrate, deposition temperature, deposition method and annealing temperature. The thermodynamics principle of film surface diffusion and film nucleation is used to explain the reasons for the different crystal structure and grain size under different technical conditions.