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本文讨论了在高温、高场强下清除SiO_2中钠离子的方法,试验数据表明本方法在生产中使用切实可行,采用此方法可以提高器件成品率。
This article discusses the removal of sodium ions in SiO 2 at high temperature and high field strength. The experimental data show that the method is feasible and practical in production, and the device yield can be improved by this method.