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Fe/Cu multilayers were prepared by alternating deposi- tions of pure iron(99.99% Fe)and copper(99.99% Cu)on cleaved Si(100)substrates by magnetron sputtering at room temperature.The background vacuum of the system was a- bout 2.4×10~(-4)Pa,and the vacuum during deposition was kept at about 0.68 Pa.The deposited thickness of each layer was monitored in-situ by a film thickness monitor.The crys-
Fe / Cu multilayers were prepared by alternating deposi- tions of pure iron (99.99% Fe) and copper (99.99% Cu) on cleaved Si (100) substrates by magnetron sputtering at room temperature. The background vacuum of the system was a- bout 2.4 × 10 -4 Pa, and the vacuum during deposition was kept at about 0.68 Pa. The deposited thickness of each layer was monitored in-situ by a film thickness monitor.The crys-