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铝含量为50%的Ta/Al复合薄膜由于其具有优良的热稳定性而适用于制造高精密、高稳定功率型电阻或功率集成电阻网络。用钽铝复合靶直流共溅射的方法可以制备这种薄膜,但淀积参数及热处理条件对薄膜的热稳定性能有很大影响。用该复合薄膜制出了功率负荷性能优良的中功率薄膜衰减器。最后,用XPS分析了薄膜表面的化学组成。
Ta / Al composite films with 50% aluminum content are suitable for use in the manufacture of high-precision, high-stability power resistors or power integrated resistor networks due to their excellent thermal stability. This film can be prepared by direct current co-sputtering of tantalum-aluminum composite target, but the deposition parameters and the heat treatment conditions have a great influence on the thermal stability of the film. With the composite film made of the power load performance of the medium-power thin film attenuator. Finally, the chemical composition of the film surface was analyzed by XPS.