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本文在A.Grove理论基础上,引入“平均自由程”概念,对低压化学汽相淀积(IPCVD)反应动力学作了分析,导出了该系统生长速度公式,并从理论上计算了反应的最佳条件。实验结果与理论分析符合得较好。
Based on A. Grove theory, the concept of “average free path” is introduced to analyze the reaction kinetics of low pressure chemical vapor deposition (IPCVD), and the formula of the growth rate of the system is deduced. The theoretical calculation of the reaction Optimal conditions. The experimental results are in good agreement with the theoretical analysis.