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扩散炉是IC和半导体器件生产线前工序的关键设备之一、主要用于对硅片进行掺杂、氧化等加工。随著IC工艺的不断进步,尤其是硅片大直径和加工微细化,对扩散炉提出了越来越高的要求,这些要求主要体现在增大炉管口径、严格微机控制、提高自动化程度、减少对硅片污染等方面。达到国内一流水平的5440型扩散炉,是由我国68家专用电子设备生产企业之一—北京建中机械厂最新研制成功的。
Diffusion furnace is IC and semiconductor device production line before the process one of the key equipment, mainly for silicon doping, oxidation and other processing. With the continuous improvement of IC technology, especially the large diameter of silicon wafers and the miniaturization of processing, higher and higher requirements are placed on the diffusion furnace. These requirements are mainly reflected in the increase of the diameter of the furnace tube, the strict control of the microcomputer, the improvement of the degree of automation, Reduce the silicon pollution and so on. To achieve the domestic first-class level of 5440 proliferation of furnace is from China’s 68 dedicated electronic equipment manufacturers - Beijing Jianzhong Machinery Factory newly developed.