本文主要介绍制备非晶态薄膜的装置。非晶态薄膜是在一个能进行原位蒸发、凝聚和电阻测量的低温恒温器中制备的。低温底板的温度可调节在10～300K之间。蒸发器用φ=0.5mm的钨丝制成。凝聚时的真空度为10~(-θ)乇量级。薄膜制备后,可随即用四引线法测量它们的电阻与温度的关系。 利用本装置己制备了非晶态Al膜和Pb膜。 This article describes the preparation of amorphous thin film device. Amorphous thin films were prepared in a cryostat capable of in-situ evaporation, condensation and resistance measurement. Low temperature floor temperature can be adjusted between 10 ~ 300K. Evaporator with φ = 0.5mm made of tungsten. The degree of vacuum at the time of aggregation is in the order of 10 to (-θ) Torr. After film preparation, they can then be measured by the four lead method, their resistance and temperature. Amorphous Al films and Pb films have been prepared using this device.