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建立了一台磁过滤脉冲阴极真空弧沉积装置 .通过在 90°磁过滤管道和阴极之间加一30～ 60V的正偏压使系统沉积速率得到了大幅度提高 .研究和观察表明 ,此时在过滤管道和阴极之间产生了阴极真空弧放电 ,并因此使阴极消耗率大幅度增大 .对此放电回路及其和MEVVA阳极 阴极之间弧放电的相互影响进行了初步的实验研究
A magnetically-filtered pulsed cathodic vacuum arc deposition device was set up and the deposition rate of the system was greatly increased by applying a positive bias of 30 ~ 60V between the 90 ° magnetic filtration pipeline and the cathode.Studies and observations showed that at this time A cathodic vacuum arc discharge was generated between the filter tube and the cathode, and as a result, the cathode consumption rate was greatly increased.This experiment was carried out on the interaction between the discharge circuit and the arc discharge between the cathode and MEVVA anode