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报道了中频双靶反应磁控溅射制备二氧化硅 (Si O2 )薄膜的装置、工艺及薄膜特性。对制备的 Si O2 薄膜的化学配比和元素化学态进行了 SAM和 XPS分析 ,测试了膜层对钠离子 (Na+ )阻挡性能、光学折射率和可见光的透过率。研究表明作者开发的中频双靶反应磁控溅射沉积 Si O2 薄膜的设备和工艺可以高速率、大面积制备高质量的 Si O2 膜。
The device, process and film properties of SiO2 (Si O2) film prepared by MF double target reactive magnetron sputtering were reported. The chemical composition and elemental chemical state of Si O2 thin films were analyzed by SAM and XPS. The barrier properties of sodium ion (Na +), optical refractive index and visible light transmittance were tested. The research shows that the equipment and technology developed by the author for magnetron sputter deposition of Si O2 thin film by high frequency and large area can be used to prepare high quality Si O2 film.