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研究了二甲基甲酰胺(DMF)中Y(Ⅲ)和Mg(Ⅱ)及Co(Ⅱ)在Pt电极上的电化学行为.结果表明,Y(Ⅲ)、Mg(Ⅱ)及Co(Ⅱ)在Pt电极上一步不可逆还原为Y(0)、Co(0)和Mg(0).在301K时,利用循环伏安法分别测定出Mg(ClO4)2-LiClO4-DMF中Mg(Ⅱ)的扩散系数和传递系数为2.95×10-6cm2·s-1和0.11;CoCl2-LiClO4-DMF中Co(Ⅱ)的扩散系数和传递系数为1.34×10-5cm2·s-1和0.24;Y(NO3)3-LiClO4-DMF中Y(Ⅲ)的扩散系数和传递系数为1.68×10-5cm2·s-1和0.10.在铜电极上于-1.50～-3.00V(vsSCE)下恒电位电沉积,得到黑色、光滑致密、粘附性好的Y-Mg-Co合金膜,其中Y含量为3.88%～58.66%;Mg含量为4.51%～17.52%.
The electrochemical behavior of Y (Ⅲ), Mg (Ⅱ) and Co (Ⅱ) at Pt electrode was investigated in dimethylformamide.The results showed that the electrochemical behaviors of Y (Ⅲ), Mg ) Was irreversibly reduced to Y (0), Co (0) and Mg (0) at the Pt electrode.Under the condition of 301K, the cyclic voltammetry was used to determine the content of Mg (Ⅱ) in Mg (ClO4) 2-LiClO4- The diffusion coefficients and transfer coefficients of Co (Ⅱ) in CoCl2-LiClO4-DMF were 1.95 × 10-6cm2 · s-1 and 0.11, respectively. The diffusion coefficients and transfer coefficients of Co NO3) 3-LiClO4-DMF, the diffusion coefficient and transfer coefficient of Y (Ⅲ) were 1.68 × 10-5cm2 · s-1 and 0.10. Electrodeposition was performed on copper electrode at -1.50 ~ -3.00V (vsSCE) Y-Mg-Co alloy film with black, smooth and dense, good adhesion was obtained, in which Y content was 3.88% -58.66% and Mg content was 4.51% -17.52%.