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利用微波等离子气相沉积法在5%～20%的氢气浓度下,制备出了超纳米金刚石薄膜(UNCD)。利用扫描电子显微镜、XRD、表面轮廓仪及拉曼光谱研究了氢气浓度对超纳米金刚石薄膜的微结构、形貌、以及相组成的影响。结果表明,随着氢气浓度的增加,晶粒粒径及粗糙度都明显增加变大;在不大于10%的氢气浓度气氛下,可以发现晶粒粒径下降到6nm,甚至更低;即便氢气浓度达到20%,晶粒粒径仍然小于10 nm。讨论了在富氩气氛下沉积的UNCD的实验结果以及沉积机制。这种极其光滑的UNCD薄膜有望在医疗,声表面波器件以及微机电系统,尤其是在重载和恶劣环境下作为超级密封材料的应用。
Ultra-nanodiamond films (UNCD) were prepared by microwave plasma vapor deposition at a hydrogen concentration of 5% ~ 20%. The effects of hydrogen concentration on the microstructure, morphology and phase composition of the super-nanodiamond films were investigated by scanning electron microscopy, XRD, surface profiler and Raman spectroscopy. The results show that with the increase of hydrogen concentration, the grain size and roughness increase obviously. When the hydrogen concentration is not more than 10%, the grain size can be reduced to 6nm or even lower. Even if the hydrogen Concentration of 20%, the grain size is still less than 10 nm. The experimental results and the deposition mechanism of UNCD deposited under argon rich atmosphere are discussed. This extremely smooth UNCD film is expected to find applications in medical, surface acoustic wave devices and microelectromechanical systems as super-sealing materials, especially in heavy-duty and harsh environments.