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在现代电子工业中,随着超精细结构加工水平的发展,线宽为微米甚至亚微米的几何图形的制作已逐渐进入工业实用阶段,因此,对光刻时套准精度也就相应提出更高要求,例如光刻最细线宽为1微米,对准精度则不应低于±0.2～±0.25微米,目前所用常规光学对准系统,由于最终受人眼功能的限制,难以保证上述要求。本文介绍的两种光电对准系统,可分为对轮廓成象和反射目标进行自动对准,精度均优于±0.25微米,并已用于投影光刻机中代替人眼对准,这一原理同样也能用于其他超精细加工中的检测和瞄准。
In the modern electronic industry, with the development of ultra-fine structure processing, the production of geometric lines with micron or even sub-micron line width has gradually entered the practical stage of industry. Therefore, the registration accuracy of lithography is correspondingly raised Requirements, such as lithography, the finest line width of 1 micron, the alignment accuracy should not be less than ± 0.2 ~ ± 0.25 microns, the conventional optical alignment system currently used, due to the ultimate limitation of human eye function, it is difficult to ensure that the above requirements. The two types of optical alignment systems described in this article can be categorized into automatic alignment of the contours and reflectors with accuracies better than ± 0.25 μm and have been used in projection lithography machines instead of human eyes, The same principle can also be used for inspection and aiming in other ultra-fine machining.