简要讨论纳米CMOS工艺下集成电路的可制造性设计(DFM)技术.首先讨论纳米CMOS中与制造性有关的工艺和器件问题,然后探讨DFM需要的工艺和器件建模工作.最后对包括有可制造性设计技术的集成电路设计流程和能较好地在大规模集成电路设计环境中开发设计/制造交互界面的有关EDA做简单介绍. This paper briefly discusses the Design for Manufacturability (DFM) of integrated circuits in nanometer CMOS process.Firstly, the fabrication-related process and device problems in nanometer CMOS are discussed, and then the process and device modeling required for DFM are discussed.Finally, IC Design Flow for Manufacturing Design Technology and a Brief Introduction to EDA Related to Developing Design / Manufacturing Interfaces for Large Scale Integrated Circuit Design Environment.